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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Per Johander, Per-Erik Tegehall, Abelrahim Ahmed Osman, Göran Wetter and Dag Andersson
IVF Industrial Research and Development Corporation Argongatan 30, SE 431 53 Mölndal Sweden Tel +46 31 706 6142, Fax +4631-276130
Printed Circuit Boards for Lead-Free Soldering: Materials and Failure Mechanisms
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
CCH3
CH3
OHHO CH2 ClCHO
CH2+
Bisphenol-A Epichlorhydrin
Epoxy
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
EpoxyThe properties are determined by the:• Resin type• Crosslinking Agent• Degree of crosslinking Tg• Thermal decomposistion temperature of the resin Td• Adhesion between resin and reinforcement• Adhesion of resin to metal foil• Additive fillers CTEThe resin types used for laminates today are mostly based on di-,
tetra- or multifunctional epoxy resins. The curing system is dicyandiamide, novolac or hydroxyl.
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Wei
ght L
oss
Decomposition Temeperature
Temp
Td
CTE
-Z30-70 ppm
150-300 ppm
Tg
Glass TrasitionTemperature
Temp
Two critical temperatures Tg and Td
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
CH2 CH2
CH2O CHO
CH2 CH2O CHO
CH2 CH2O CHO
CH2
Epoxy Phenolic Novolac Resinn
CH2O CHO
CH2
CH2O CHO
CH2
CHHC
CH OCHO
CH22
CH OCHO
CH22
Tetra functional Epoxy Resin
HC
CH OCHO
CH22
Tris functional Epoxy Resin
CH2O CHO
CH2
CH2O CHO
CH2
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
New Halogen free Reactive flame retardants
OO PH
DOPO
OOPO
NN
NNH
NH 2
Diphenyl phosphato benzo guanamin
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Polymerisation reaction Epoxy - DOPD
CCH3
CH3
CH2O CHO
CH2CH OCHO
CH22
OO PO
CCH3
CH3
CH2O CHO
CH2CH OCHO
CH22
HCH2CH
OCH2
HO
CCH3
CH3
CH OCHO
CH22
OO PO
HH
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Failure DescriptionConductive Anodic Filament (CAF) growth is a conductive copper-containing salt created electrochemically that grows from the anode toward the cathode subsurface along the epoxy/glass interface. CAF is associated primarily with mechanically drilled holes where the mechanical drilling disrupts the glass reinforcement fibers in glass bundles permitting the absorption of subsequent processing chemistry between fibers and epoxy.
From IPC-9691, User Guide for the IPC-TM-650, Method 2.6.25, Conductive Anodic Filament (CAF) Resistance Test (Electrochemical Migration Testing).
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Electrochemical ReactionsReactions at the anode:H20 → ½O2 + 2H+ + 2e-
Cu → Cuz+ + ze-
Reactions at the cathode:2H20 + 2e- → 2OH- + H2
½O2 + H20 + 2e- → 2OH-
(Cuz+ + ze- → Cu)The reactions are basically the same that occur during dendrite formation except that reduction of copper ions may not occur.
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
CAF formed between Via Holes
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
CAF formed between Conductors
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Standard for CAF Testing
IPC-TM-650, Method 2.6.25, Conductive Anodic Filament (CAF) Resistance Test: X-Y Axis.The test board shall have alternating rows of connected vias. Section A has in-line hole to hole and Section B has staggered hole to hole.
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Test Patterns on Section A
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Pattern 1via to via270 μmVertical
Pattern 2via to via510 μm Vertical
Pattern 3via to via270 μm
Horizontal
Pattern 4via to via510 μm
Horizontal
Pattern 5BGA
34x34Full array
1,0 mm pitch
Pattern 6BGA
34x34Full array
1,0 mm pitch
A B C D E F G H J K L
Layout component side Vertically viasPatterns 1 and 2
Horizontal viasPatterns 3 and 4
Layers 2 and 4 BGA components.
Layers 3 and 5, BGA components
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Acceptance Criterion for Method 2.6.25
• A more than a decade drop in the insulation resistance after the stabilization time.
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Factors Affecting CAF Formation• Humidity
• Spacing
• Voltage
• Ionic contamination
• Mechanical stress, for example during drilling and soldering
• Glass to resin bond strength
• Via to glass fibre alignment, warp or fill direction
• PCB properties
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Test Conditions in Method 2.6.25• 65 ± 2°C or 65 ± 2°C
• 87 +3/-2% RH
• One Mohm current limiting resistors in series for each current path
• 96 h stabilization at test conditions prior to applying bias
• Test duration minimum 500 h
• Bias two times the maximum operating voltage
• 100 VDC test voltage with same polarity as bias
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Board designation
No. of boards
Conditions
Boards A 11 MSL 3, 30°C and 60% RH for 192 h
Boards B 5 85°C and 85% RH for 1068 h + bake at 125 °C for 12 h
Boards E 6 85°C and 85% RH for 984 h + drying in a cabinet at 46°C and 4% RH for 1752 h
Boards F 6 MSL 1, 85°C and 85% RH for 168 h
Experimental matrix for absorption and desorption tests.
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Board designation
No. of boards
Preconditioning Soldering
Boards A 11 MSL 3, 30°C and 60% RH for 192 h
3 lead-free soldering processes
Boards B 5 85°C and 85% RH for 1068 h + bake at 125 °C for 12 h
3 lead-free soldering processes
Boards C 4 None 3 lead-free soldering processes
Boards D 4 None None
Experimental matrix for the CAF test
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
0
0,1
0,2
0,3
0,4
0,5
0,6
0 50 100 150 200 250Time (h)
Wei
ght %
JEDEC level 1
JEDEC level 3
0
0,1
0,2
0,3
0,4
0,5
0,6
0,7
0,8
0 500 1000 1500 2000 2500 3000Time (h)
Wei
ght %
Dry Cabinet 46°C 4% Rh
Bake 125 °C
85 °C 85% Rh
Weight increase/decraese due to humidity absorption/desorption in the printed circuit boards at various conditions
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
a)
b)
(a) SAM and (b) X-ray images of a test board after exposure to JEDEC level 1 followed by 3 reflow soldering cycles.
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Via hole resistance - Boards A
0
1
2
3
4
5
6
7
8
9
0,00 100,00 200,00 300,00 400,00Time (h)
log
R
Pattern 1 Vertical 270 µm Pattern 2Vertical 510 µmPattern 3Horizontal270 µm Pattern 4Horizontal510 µm
MSL 3, 30°C and 60% RH for 192 h3 lead-free soldering processes
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Via hole resistance - Boards B
0
1
2
3
4
5
6
7
8
9
0,00 100,00 200,00 300,00 400,00Time (h)
log
R
Pattern 1 Vertical 270 µm
Pattern 2Vertical 510 µm
Pattern 3Horizontal270 µm
Pattern 4Horizontal510 µm
85°C and 85% RH for 1068 h + bake at 125 °C for 12 h3 lead-free soldering processes
24
IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
25
IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Via hole resistance - Boards C
0
1
2
3
4
5
6
7
8
9
10
0,00 100,00 200,00 300,00 400,00Time (h)
log
R
Pattern 1 Vertical 270 µm
Pattern 2Vertical 510 µm
Pattern 3Horizontal270 µm
Pattern 4Horizontal510 µm
No humid pre conditioning
3 lead-free soldering processes
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Via hole resistance - Boards D
0
1
2
3
4
5
6
7
8
9
10
0,00 100,00 200,00 300,00 400,00Time (h)
log
R
Pattern 1 Vertical 270 µm
Pattern 2Vertical 510 µm
Pattern 3Horizontal270 µm
Pattern 4Horizontal510 µm
No humid pre conditioning
No lead free soldering
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Resistance between Layer 2 & 4 and via holes
0
2
4
6
8
10
12
0,00 50,00 100,00 150,00 200,00 250,00 300,00 350,00 400,00Time (h)
Log
Res
ista
nce
Boards D
Boards C
Boards A
Boards B
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IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Resistance between Layer 3 & 5 and via holes
0
2
4
6
8
10
12
0,00 50,00 100,00 150,00 200,00 250,00 300,00 350,00 400,00Time (h)
Log
Res
ista
nce
Boards D
Boards C
Boards B
Boards A
29
IVF Industrial Research and Development Corporationwww.ivf.se
Temadag Miljö och Elektronik12 April 2007 Oslo
Photographs of CAF (from IPC 9691)
Source: IPC-9691