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5 ML Co/Graphene/ Ir (111) 升溫實驗. 校外指導教授:蔡志申 教授 校外指導老師: 謝振源 學長 校內指導老師:傅思平 老師 實驗生:顧揚清. 關鍵詞解釋. ML: Monolayer, 及原子層 Co: 全名為 Cobalt , 即「鈷」 Graphene: 縮寫為 G , 即「石墨烯」 Ir (111): 全名為 Iridium , 及「銥」 , (111) 是晶格排列的方式 垂直磁異向性 磁紀錄媒體. 5ML Co. 1ML Graphene. - PowerPoint PPT Presentation
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5ML Co/Graphene/Ir
5 ML Co/Graphene/Ir(111)
1ML: Monolayer, Co: Cobalt ,Graphene: G ,Ir(111): Iridium ,, (111)2Ir(111)5ML Co1ML Graphene
3 5 ML Co/Graph- ene/Ir(111)(300~900K)900K1*14
53CGraphene&
6
7(Ultrahigh Vacuum machine, UHV)(Auger electron spectroscopy, AES)(Low-energy electron diffraction, LEED)(Surface Magneto-Optic Kerr Effect, SMOKE(Sputtering)(Electron Beam Evaporation, EBE)
8(Ultrahigh Vacuum machine, UHV)(Auger electron spectroscopy, AES)(Low-energy electron diffraction, LEED)(Surface Magneto-Optic Kerr Effect, SMOKE(Sputtering)(Electron Beam Evaporation, EBE)
9(Ultrahigh Vacuum machine, UHV)(Auger electron spectroscopy, AES)(Low-energy electron diffraction, LEED)(Surface Magneto-Optic Kerr Effect, SMOKE(Sputtering)(Electron Beam Evaporation, EBE)
10(Ultrahigh Vacuum machine, UHV)(Auger electron spectroscopy, AES)(Low-energy electron diffraction, LEED)(Surface Magneto-Optic Kerr Effect, SMOKE(Sputtering)(Electron Beam Evaporation, EBE)
11(Ultrahigh Vacuum machine, UHV)(Auger electron spectroscopy, AES)(Low-energy electron diffraction, LEED)(Surface Magneto-Optic Kerr Effect, SMOKE(Sputtering)(Electron Beam Evaporation, EBE)
12(Ultrahigh Vacuum machine, UHV)(Auger electron spectroscopy, AES)(Low-energy electron diffraction, LEED)(Surface Magneto-Optic Kerr Effect, SMOKE(Sputtering)(Electron Beam Evaporation, EBE)
13(UHV)
14
(AES)
15(LEED)
16
Lattice ()17
Surface Magneto-Optical Kerr Effect, SMOKE
MMMr18
Sputtering(Ar)Ar
1920
Electron Beam Evaporation(Co)5 MLFLUX/min.
21
Co-5 ML22Co----------------------------------CoCo
2324Ir(111)5ML Co1ML GrapheneIr(111) (Iridium)G*1 ML (Graphene)Co*5 ML (Cobalt)
25(900 K)(Ethylene, C2H4)Co*5 ML(300~900 K)
2650 KAES, LEED, SMOKE
27
28Co775G272
29G
30
()
30
Pure Ir ( 111 )
GrapheneLEED(Co)
00Beam32Co 5 ML / Graphene / Ir (111)LEED (300 K)
00Beam33300 KCo*5 MLCo 5 ML / Graphene / Ir (111)LEED (350 K)
00Beam34Co 5 ML / Graphene / Ir (111)LEED (400 K)
00Beam35Co 5 ML / Graphene / Ir (111)LEED (450 K)
00Beam36Co 5 ML / Graphene / Ir (111)LEED (500 K)
00Beam37500 K00beamCo 5 ML / Graphene / Ir (111)LEED (550 K)
00Beam38Co 5 ML / Graphene / Ir (111)LEED (600 K)
00Beam39Co 5 ML / Graphene / Ir (111)LEED (650 K)
00Beam40Co 5 ML / Graphene / Ir (111)LEED (700 K)
00Beam41Co 5 ML / Graphene / Ir (111)LEED (750 K)
00Beam42Co 5 ML / Graphene / Ir (111)LEED (800 K)
00Beam43Co 5 ML / Graphene / Ir (111)LEED (850 K)
00Beam44Co 5 ML / Graphene / Ir (111)LEED (900 K)
00Beam45900 K1*1CoCo*5 MLGraphene300 KCo*5 ML500 K00beam900 K1*1Co465MLCoGraphene300KCo
500K00beamCo
900K1X1
46L-MOKE
47P-MOKE
48LP
49L500 K~550 KP(Spin-reorientation Transi- tion, SRT)5 MLCo1*1(Perpendicular Magnetic Aniso-tropy, PMA)()
50LP
500K~550KLPP
5MLCo1X1
50
51 52 53
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