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Vacuum Coating Equipment and Supplies Additional free information on any of these items can be obtained by circling the appropriate number on the reader service card. Vacuum Coating Systems Sputter Ion Plating Systems DynaVac leybold Technologies Inc. Weymouth, Mass. Enfield, Conn. DynaVac offers a complete line of vacuum coating systems for a wide range of applications. Included are systems for physical vapor deposition of thin films, batch and inline sputtering, and metallizing. Emphasis is put on industrial grade designs for production and/or continuous use. All systems are offered with control system architecture ranging from basic logic to advanced supervisory control. Ieybold’s patented dual-cathode arrangement al- lows simple and reliable sputter-ion plating perform- ance. A gas discharge created between a pair of opposing magnetron cathodes, the Ionic Gemini, generates a plasma concentrated around negatively biased parts to be coated. Simultaneously, the sputter- ing process acts on the cathodes, removing target material, which uniformly distributes itself around the substrates, condensing on the substrates under con- stant ion bombardment while retaining the stoichiom- etry of the sputtered target material. The result is uniformly distributed coatings having properties that remain constant over the full surfaces of the coated substrates. Employment of appropriate sputtering sources (magnetron cathodes) allows depositing stoi- chiometric films of multicomponent alloys and chemi- cal compounds with the ability to produce films having an almost unlimited range of colors from bright yellow and gold tones to grays and black. Circle 083 on reader information card Circle 082 on reader information card Sputtering Systems Hauzer Vat-Tee Inc. Boulder, Co/o. Thin Film Deposition Materials Research and PVD Materials Corp. Wyne, N.J. Hauzer’s patented ABS system (designating Arc Bond Sputtering) combines highly energized cathodic arc and precision unbalanced magnetron processes to provide metal finishers with turn-key, computer-controlled vacuum coating hardware. Research and PVD Materials Corp. manufactures a comprehensive offering of highly characterized materials for the diverse and sophisticated requirements of the semiconductor, electronics, electro-optic, and related re- search communities. Thin film deposition materials availa- ble from this single, quality source of supply include but are not limited to fabricated metals, alloys, ceramics, and custom manufactured one-of-a-kind sputtering targets and evaporation sources. Circle 084 on reader information card Circle 085 on ti METAL FINISHING . MARCH 1995 0 Copyright Elsevier Science Inc. 45

Thin film deposition materials

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Vacuum Coating Equipment and Supplies

Additional free information on any of these items can be obtained by circling the appropriate number on the reader service card.

Vacuum Coating Systems Sputter Ion Plating Systems DynaVac leybold Technologies Inc. Weymouth, Mass. Enfield, Conn.

DynaVac offers a complete line of vacuum coating systems for a wide range of applications. Included are systems for physical vapor deposition of thin films, batch and inline sputtering, and metallizing. Emphasis is put on industrial grade designs for production and/or continuous use. All systems are offered with control system architecture ranging from basic logic to advanced supervisory control.

Ieybold’s patented dual-cathode arrangement al- lows simple and reliable sputter-ion plating perform- ance. A gas discharge created between a pair of opposing magnetron cathodes, the Ionic Gemini, generates a plasma concentrated around negatively biased parts to be coated. Simultaneously, the sputter- ing process acts on the cathodes, removing target material, which uniformly distributes itself around the substrates, condensing on the substrates under con- stant ion bombardment while retaining the stoichiom- etry of the sputtered target material. The result is uniformly distributed coatings having properties that remain constant over the full surfaces of the coated substrates. Employment of appropriate sputtering sources (magnetron cathodes) allows depositing stoi- chiometric films of multicomponent alloys and chemi- cal compounds with the ability to produce films having an almost unlimited range of colors from bright yellow and gold tones to grays and black.

Circle 083 on reader information card

Circle 082 on reader information card Sputtering Systems Hauzer Vat-Tee Inc. Boulder, Co/o.

Thin Film Deposition Materials Research and PVD Materials Corp. Wyne, N.J.

Hauzer’s patented ABS system (designating Arc Bond Sputtering) combines highly energized cathodic arc and precision unbalanced magnetron processes to provide metal finishers with turn-key, computer-controlled vacuum coating hardware.

Research and PVD Materials Corp. manufactures a comprehensive offering of highly characterized materials for the diverse and sophisticated requirements of the semiconductor, electronics, electro-optic, and related re- search communities. Thin film deposition materials availa- ble from this single, quality source of supply include but are not limited to fabricated metals, alloys, ceramics, and custom manufactured one-of-a-kind sputtering targets and evaporation sources.

Circle 084 on reader information card

Circle 085 on ti

METAL FINISHING . MARCH 1995 0 Copyright Elsevier Science Inc. 45