PLASMA SOURCES PLASMA SYSTEMS PLASMA APPLICATIONS RESEARCH ...€¦ · cyrannus® by plasma sources plasma systems plasma applications research & development p l a s m a e a s y t

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PLASMA SOURCES PLASMA SYSTEMS PLASMA APPLICATIONS RESEARCH & DEVELOPMENT P L A S M A E A S Y T O A P P L Y !

CYRANNUS ®

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Welcome at iplas.

See the latest developments!

CYRANNUS®

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High performance plasma

EH-tuner

magnetron

circulatorplasma source

CYlindrical Resonator with ANNUlar Slots

• from vacuum to atmosphere

• uniform plasma

• large plasma extension

• high power density

• easy and stable ignition


• uniform plasma





• uniform plasma




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spatial homogeneous

stationary plasma

central excitation area

from vacuum to ambient pressure

arbitrary process gas

high gasflow possible

electrodeless plasma excitation

few maintenance required

Performance of CYRANNUS®I plasma source

CYRANNUS®I plasma source

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Applications

Processes

iplas‘ plasma know-how

Diamond deposition is one application from a large

variety of plasma processes

Synergy effects from

various applications

• film growth

• surface modification

• material removal

• gas chemistry

• gas dynamics

• . . .

diamondactivation

glas

coating

polymeri-

sation etching

exhaust

cleaning

• film growth



• gas chemistry

• gas dynamics

• . . .

Synergy effects from

various applications

• film growth



• gas chemistry

• gas dynamics

• . . .

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Plasm

a

Substrate

Process gas

+ precursor

Plasm

a

source

Process

gas

Substrat

e

Precursor

Activated

species

Plasma

Plasma

source

„ direct“ plasma treatment

Substrates are treated within the area of

plasma generation.

Typical application:

diamond deposition, exhaust cleaning

„down stream“ plasma treatment

Substrates are treated beside the area of

plasma generation, down stream, close to

plasma source.

Typical application:

activation of surfaces, deposition of SiOx

Use of plasma source in different

configuration

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0.5mm

Examples: diamond growth

CYRANNUS® plasma is used for various types diamond

<100> and HOD on Silicon

5µm

5µm

50µm

homoepitaxial growthultra nano

crystalline diamond

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CYRANNUS® processes

. . . a large spectrum

depositionvarious coatings (scratch and corrosion

resistance, optics, diffusion barrier)

growth rate of several µm/min

(SiOx/polymer) or 5-50 µm/h (diamond)

windows,

free standing

structures,

MEM

random <100>

highly oriented

<100>

functionalisationhydrophobic surface for water repellent

property on various materials

treatment time

< 10 sec

water on functionalized carbon

activationimproved wetting of varnish or dye,

increased adhesion

3D plastics activation, > 70 dyn/cm

treatment time 1-10 sec

local activation

of damaged

bumpers

plasma treated

bumper

untreated bumper

etching / ashingremoval of photo resist, stripping of coatings

ca. 5 µm desmearing of circuit boards

removal of oxides

from lead frames

within few

seconds

before plasma

treatment

after plasma treatment

cleaningultra cleaning, degreasing for adhesion

improvement

fast on-line cleaning

complete cracking of moleculesdestruction of molecules

abatement, exhaust cleaning,

waste destruction

reforming

pic

ture

: u

niv

eri

ty o

f D

ort

mu

nd

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Supply spectrum

. . . for all technology needs

Systems

• lab units

• manual systems

• semi-automatic

systems

• production systems

Services

• feasibility

• R&D

• prototypes

Components

• CYRANNUS I -

plasma sources

• CYRANNUS II -

plasma sources

• EH-Tuner

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Scaling of plasma

CYRANNUS® plasma can vary in diameter and volume

915M Hz 2 .45GHz 9 .55GHz

1 . 230mm 85mm 22mm

2. 380mm 140mm 36mm

3. 530mm 190mm 50mm

4. 675mm 220mm 63mm

5. 800mm 290mm 75mm

Plasma size increases

with

• excitation frequency

• order of antennas



Plasma size increases

with



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iplas

~ develops and produced leading microwave plasma

technology basing on CYRANNUS® principle

~ covers several application fields of plasma technology

as core competence with focus on reliable technology

which is easy to handle

~ co-operates with partners who in general are global

players with a good market position in their specific

field

~ is independent and privately owned

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CYRANNUS®I plasma sources

comparison of equipment at 2.45GHz and 915MHz

CYRANNUS® I - 6“plasma source (2.45 GHz)

CYRANNUS® I - 16“plasma source (915 MHz)

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Equipment scaling from 2.45GHz

to 915MHz

relation of plasma source

sizes

[2.45GH 915MHz; similar

coupling structure]

plasma source

tunercirculator

magnetron

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scalabitity of plasma sources for

larger diameter

2.45 GHz,

at 259 hPa

CYRANNUS®I -16” plasma source

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CYRANNUS® Diamond CVD unit

Flexibility in technique and budget

• semi-automated

operation

• compact set-up

• high performance from

proofen production

design

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Gas Flow Dominated Reactions in

Atmospheric Plasma

Plasma

generates

radicals . . .

• Gas flow in plasma afterglow

• High mass transport

• Intensive gas phase interaction /

low wall interaction

... and interacts

with surface

• Lamiar flow ?

• Turbulent flow !

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Reactions of ions, radicals and

electrons in plasma

Plasma

generates

radicals . . .... excitation and

cracking in gas phase

... interaction with

surface

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Plasma chemistry reactor

Washer

Plasma-

cracking

waste gas

cracked gas

neutralised gas

• plasma catalytic reactions

• high cracking energy from

excited electrons

• contact free excitation

• wast gas cleaning

• nano particle synthesis

• Hydrogen synthesis

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Nano Particle Synthesis

Synthesis of nano particles in CYRANNUS systems enables new

qualities and very high productivity

microwave excitation allows non-equilibrium chemical reactions (clean

compound, no reactive chemicals (burner) required

high pressure operation of plasma (up to several bar) allows high gas

flow rates and very high production quantities (several pounds per hour)

precise process control via plasma parameters and gas flow (generation

of particle size with very small variation)

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Nano Particle Synthesis - Example

Ultra clean Silicon

synthesis von large quantities of clean (purified) Silicon by decomposition

of Silan

purification via chemical reaction (Silan synthesis)

recovering by cracking reaction (Silicon particle synthesis)

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Bio Agredable Nano Surface

Ultra clean Silicon

synthesis von large quantities of clean (purified) Silicon by decomposition

of Silan

purification via chemical reaction (Silan synthesis)

recovering by cracking reaction (Silicon particle synthesis)

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Plasma treatment of surfaces

- a modular and compact system-

easy connection to customer„s PLC

simple and fast maintenance or repair

by exchange of complete modules

very fast supply time through

standardisation of modules

Individual systems, made of

standardised modules

CYRANNUS®I plasma systems

for development and production

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www.cyrannus.com

Phone +49(0)2241 93268-0

Fax +49(0)2241 93268-15

Fragen ?

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Plasma chemistry reactor

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PLASMA SOURCES PLASMA SYSTEMS PLASMA APPLICATIONS RESEARCH ...€¦ · cyrannus® by plasma sources plasma systems plasma applications research & development p l a s m a e a s y t