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Integrating HDI Technologies with Rigid-flex Presenter: Bill Beckenbaugh, PhD VP, Design & Engineering Multek 11/16/2011

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Integrating HDI Technologies

with Rigid-flex

Presenter: Bill Beckenbaugh, PhD

VP, Design & Engineering Multek

11/16/2011

Produced more than 600M PCB pcs for Mobile Devices.

Shipped 61M handset PCBs in 2010

15 years in mobile PCB and 5 years in mobile FPC

8 factories on 4 continents with over 2M sq.ft manufacturing space.

Top 5 Leading Suppliers HDI PCB - Prismark 2010

Build HDI, Rigid-Flex, FPC/A, Displays, and Touch Panels for Mobile Devices

Over $475M capital investment during the last 6 years.

Multek Facts

Every Layer Interconnect(ELIC)

& Rigid-flex Market Outlook

Mobile Phone Segment Forecast

Smartphone shipment will reach 4.05 billion in 2011, increases YoY 49.89%.

Smartphones will account for more than 25% of standard mobile phone, and >30% in 2012.

Apple’s iOS market share is predicted to increase to 22% in 2011; while Android goes to 25%.

Increasing demand for smartphone continues to benefit manufacturers of advanced components

such as MEMS sensors, optical materials, touch solutions, and all HDI PCB technologies.

Source: IDC/ Gartner

Smartphone and Tablet volume demands for unique HDI interconnect materials and processes

are funding the global future of PCB industry process, materials, and equipment innovations.

| Copyright ©2011 Multek. All rights reserved. |

5

Source: Japan Marketing Service, LTD., 2010 RFC & FPC Report

| Copyright ©2011 Multek. All rights reserved. |

Technology Drivers in Portables

7

Mobile Phone - Technology Revolution

10L ELIC

1217 K lasers

5 X solid via plating

4 X pressing

4 + 2 + 4

2,147 K lasers

4X solid via plating

4X pressing

3 + (4) + 3

878 K lasers

3 X solid via plating

4 X pressing

Complexity

YR2008 YR2009 YR2010 YR2011 YR2012 YR2013

2 + 6 + 2

175 K lasers

no solid via plating

2X pressing

2 + (6) + 2

260 K lasers

2X solid via

plating

3X pressing

All major customers are moving to ELIC !!

ELIC

Medias

Ultra Thin 7.7mm

Android 2.2

5.1 megapixel

CMOS camera

1Seg digital TV tuner

E-wallet function

3G/GSM

microSDHC

Infrared comm /Blutooth,

GPS and Wifi

105g weight

NB,3C,Mobile,MP3

Module, GPS

3G PDA combine GPS

3G Smart phone

4G Products

ELIC-HDI

0.3mm

L/S 50/50

ELIC-HDI

0.25mm

L/S 35/35

0.3 mm BGA

2 mil center core

2 mil lines/spaces

10 -12 layer ELIC

Solid Via on all 4 layer

1 mil SM registration

2.2 million holes/panel

3 mil micro via size

8 mil min pad size

No mechanical holes

| Copyright ©2011 Multek. All rights reserved. |

E-Book PCB & Display at a glance

LCD Display

Rigid PCB

Touch Panel – Acoustic

Touch

FPC

ITO Material

| Copyright ©2011 Multek. All rights reserved. |

9 | Copyright ©2011 Multek. All rights reserved. |

Miniaturization continues pace: Wafer Scale Array ICs & 01005 SMT &

beyond drive X,Y, & Z axis volumetric design for connectivity

01005

(M0402) 0050025 ??

(M0201)

CONFIDENTIAL | Copyright ©2011 Multek. All rights reserved.

Recess cavity

75150

30050

50

50

250

200

300

75

Inner Layer Outer Layer

Top View Cross Section

0.3mm pitch

VSDM in build-up layer

XStatic

Top

Plane

Signal / Plane

Signal / Plane

I/O

Passive

Signal 3

Signal / Plane

Signal / PlaneSignal / Plane

Plane

Bottom

XStatic Core

Signal 1

VSD™

Layer

Connector

I/O

GND Plane

Signal 2

Signal 3

PassiveActive

Shocking Technology

ELIC Capabilities

Multek New Technology Focus for Smartphone/Tablet

| Copyright ©2011 Multek. All rights reserved. |

11

Filled µvia HDI

Technical Advantages of solid via

Improved solder join reliability

Elimination of air bubble

Reduce solder short in BGA (0.5mm pitch or less )

Improved PCB design

Enhance circuit routing flexibility

Size reduction of PCB

Improve thermal performance

Enhance signal quality

(shorter path)

| Copyright ©2011 Multek. All rights reserved. |

ELIC and FPC Development

for Rigid-flex

Process flow comparison of stacked via technologies

Interconnect technology ELIC + HDI ALIVH-C B2it + HDI

Layer structure

Inner layer

Conductive

material Cu plating Cu paste Ag past

Process

Connection Plating joint Compression joint Compression joint

Outer layer Process Laser + cu plating Laser + cu plating Laser + cu plating

| Copyright ©2011 Multek. All rights reserved. | 15

Plated stacked uVia Process overview

14 | Copyright ©2011 Multek. All rights reserved. |

L4 L3 L2

Prepreg L8

Prepreg L1

Prepreg L2

Prepreg L7

Prepreg L6

Prepreg L3

Core L4 & L5

L1 1. Laser Drill

2. Print & Etch Circuit

3. Copper Plate

4. Laminate

5. Laser Drill X2

6. Print & Etch Circuit

7. Copper Plate

8. Laminate

9. Laser Drill X2

10. Print & Etch Circuit

11. Copper Plate

12. Laminate

13. Laser Drill X2

14. Print & Etch Circuit

15. Copper Plate

cu1

tcu2

bcu2

bcu3

tcu3

tcu4

bcu4

15 | Copyright ©2011 Multek. All rights reserved. |

ELIC & Copper solid via

Copper solid via & stack microvia (Plating method) Methodology

- Copper filling of µvia by electroplating

- Process with special plating additive system & agitation (impingement)

- DC plating method in Multek

Localized

accumulation of

brightener accelerates

the plating inside via

16 | Copyright ©2011 Multek. All rights reserved. |

Process Flow-8 Layer ELIC

Cu reduction : L4/5

Laser drill :

L4/L5

PTH/ uvia filling

Dry film

DES & AOI : L4 & L5

Oxide replacement

Lamination : L3/6

Cu reduction : L3/6

Laser drill :

L3/L4 & L6/L5

PTH/ uvia filling

Dry film

DES & AOI : L3 & L6

Oxide replacement

Lamination : L2/7

Cu reduction : L2/7

Laser drill :

L2/L3 & L7/L6

PTH/ uvia filling

Dry film

DES AOI : L2 & L7

Oxide replacement

Lamination : L1/8

Cu reduction : L1/8

Laser drill :

L1/L2 & L8/L7

PTH/ Cu filling

Dry film

DES & AOI : L1 & L8

S/M

Routing; QC/ET

Remark : Only key process steps are shown.

17

Multek FPC Process Capabilities

25um µVia – Novaflex HDI

Roll-to-Roll FCCL

Fine lines <50um L/S – LDI and Liquid Photo resist capabilities

Laser Drill – YAG & CO2 for µVia

75um µVia FPC’s (HDI)

Stacked & Solid Via on RFPC (HDI)

Controlled Impedance

Laminated Shielding Film & “Air-Gap”

Conductive Adhesive & Metal Stiffener for heat dissipation

Stiffeners on FPC sections: P.I. & PET Films; SS & Aluminum; FR4

Multi-Layer & Rigid-Flex capabilities up to 12 Layers

| Copyright ©2011 Multek. All rights reserved. |

18

PTH hole quality: FPCs require optimized drill/de-smear processing

De-smear and plating done in horizontal lines yields excellent PTH uniformity

| Copyright ©2011 Multek. All rights reserved. |

XStatic: A Voltage Switchable Dielectric™ (VSD™)

“ Polymer Diode”

Shocking Technologies

19

A Voltage Switchable Dielectric™ (VSD™) behaves like an insulator (dielectric) during

normal circuit operation and becomes conductive when voltage surpasses a predefined

threshold.

During conduction, the resistance changes so as to maintain a constant clamp voltage. The

material becomes an insulator again after the voltage drops back below the threshold to

normal operating levels.

The clamp is bi-directional – working equally well with both positive and negative pulsed

events.

The sub-nanosecond response time is fast enough to clamp ESD transients to a safe level.

Insulator

Conductor

ESD Transient Voltage

+100 V +200 V +300 V +30 KV

Clamp Voltage

“Adjustable”

-100 V -200 V -300 V -30 KV

Clamp Voltage

“Adjustable”

“Normal”

Operation

XStatic

VSDM

Plated via connecting net

of interest to VSD Switching Gap

Ground

Plane

How It Works

Shocking Technologies

21

Customer qualification

VSD material characterization

Processing - laser drilling, desmear, PTH/plating

ELIC TV of using VSDM Cu foil in build-up layer

XStatic Structure: Via pad to Ground plane

XStatic Core

Top

Plane

Signal / Plane

Signal / Plane

I/O

Passive

Signal 3

Signal / Plane

Signal / Plane

Signal / Plane

Plane

Bottom

Shocking Technology integration with our ELIC process

| Copyright ©2011 Multek. All rights reserved. |

Rigid Flex Roadmap

23

Roadmap: ELIC Technology

2011 2012 2013

Layer count

Thickness

Min. core

thickness

Inner Layer *

Lines & Spaces

Outer Layer *

Lines & Spaces

Standard ≤ 12, advanced 14

0.060 “ (1.50 mm)

0.002” (50 µm)

2/2 mil

Standard 2.5/2.5 mil, advanced 2/2mil *

Copyright ©2011 Multek. All rights reserved. |

Min. dielectric

thickness 0.002” (50 µm)

* Outer layer L/S should be reviewed base on actual design, in case of via filling, fine L/S, PTH hole

on same layer (PTH size tenting limitation)

0.0016” (40 µm)

0.0016” (40 µm)

24

Roadmap: Rigid-flex Technology

2011 2012 2013

Layer Count

≤0.95”(2.40mm) ≤0.157”(4.00mm)

| Copyright ©2011 Multek. All rights reserved. |

Thickness

Min. Dielectric

Thickness

Inner Layer ( P&E )

Lines & Spaces

Outer Layer

Lines & Spaces

12 ≤15

0.0018”(45 um)

Standard 2.5/2.5 mil, Advanced 2/2 mil on specific designs

Standard 3/3 mil, Advanced 2/2 mil on specific designs

25

5 mil

125um

0.8 : 1

Min.

Drill size

µ-via pads (DHS +)

Aspect Ratio

Up to 4+N+4, ELIC, 0.4mm BGA pitch Designs

Roadmap: Microvias

2011 2012 2013

Standard Advanced Standard Advanced Standard Advanced

0.8 : 1 0.8 : 1 0.8 : 1 1 : 1 1 : 1

5 mil

125um

5 mil

125um

4 mil

100um

4 mil

100um

3 mil

75um

5 mil

125um

4 mil

100um

4 mil

100um

3 mil

75um

3 mil

75um

3 mil

75um

DHS = drilled hole size

| Copyright ©2011 Multek. All rights reserved. |

26

Soldermask

Registration

Soldermask

dam

Legend ink

Soldermask

Standard (green): Taiyo PSR 4000 Z26/G23K/MP/SP08

Halogen free (black): Taiyo PSR 4000 EG23 / PSR 2000 ME8H

Halogen free (blue): Taiyo PSR 4000 GP01/BL01/SP13

Halogen free (green): Taiyo PSR 4000 GEC50

Roadmap: Soldermask & Graphics

2011 2012 2013

Standard Advanced Standard Advanced Standard Advanced

1.5 mil

38um

1.5 mil

38um

1.5 mil

38 um

1 mil

25um

1 mil

25um

1 mil

25um

3 mil

75um

2.4 mil

60um*

2.4 mil

60um

2 mil

50um

2 mil

50um

2 mil

50um

4mil / 100um line width (legend printer)

6 mil / 150 µm line width (screen printer)

* For black soldermask, min. dam is 60um for BGA and 100um for bridge between fingers.

| Copyright ©2011 Multek. All rights reserved. |

27

min. pad width: 4 mil / 0.1 mm

min pitch: 4 mil / 0.1 mm

Roadmap: Electrical Testing

SE Impedance

50 Ohms

Diff. Impedance

100 Ohms

2011 2012 2013

Flying Probe

Electrical Test

(fixture)

min. pad width: 4.8 mil / 0.12 mm

min pitch: 4.3 mil / 0.11 mm

Pad size

Pitch

Pad width

Pitch

± 10% ± 10% ± 10% *

± 10% ± 10% ± 10% *

* Depending on design (construction, trace width, …)

If impedance line width is less than 75um, the impedance tolerance requires design review

| Copyright ©2011 Multek. All rights reserved. |

Conventional PTH Rigid-flex

Product Examples

29

Rigid flex

10 layer rigid flex

µVias from layer 1 to 10

Surface finish: OSP

| Copyright ©2011 Multek. All rights reserved. |

30

Rigid flex

6 layer rigid flex

µVias on layer 1 & 6

Surface finish: ENIG

ZIF finger in the inner layer

FR4 stiffener & Shielding film

| Copyright ©2011 Multek. All rights reserved. |

31

Rigid flex

10 layer rigid flex

Vias from layer 1 to 10

Surface finish: ENIG

| Copyright ©2011 Multek. All rights reserved. |

Next-gen Rigid-flex based on

ELIC HDI and advanced FPC

Technologies

33

Embedded Flex “e-Flex”: comparison to HDI/ELIC Rigid-flex

Source: Ibiden product publication, 2009

•Compatible with Rigid PCB stacked via processing

•Retains dynamic flex, rapid prototyping, and improved panel utilization

•Proprietary technology requiring license and technology transfer limits availability

| Copyright ©2011 Multek. All rights reserved. |

34

Rigid Flex – (1+2+2+2+1)

Thickness Descrption Material Spec.

20 µm Soldermask PSR4000 BL01

10 µm Plated Cu

22 µm Plated Cu

L1 9 µm Copper foil Hoz

50 µm Normal Prepreg Tu-72P 106(73%)

20 µm Plated Cu

L2 9 µm Base Cu of CCL

50 µm FR4

L3 15 µm Base Cu of CCL

75 µm No flow Prepreg Tu-84P NF 1080(63%)

203 µm FR4 TU-722 8mil H/H

75 µm No flow Prepreg Tu-84P NF 1080(63%)

12 µm PI of CL

25 µm Ahd of CL

L4 15 µm Base Cu of FCCL

25 µm PI of FCCL

L5 15 µm Base Cu of FCCL

25 µm Ahd of CL

12 µm PI of CL

75 µm No flow Prepreg Tu-84P NF 1080(63%)

203 µm FR4 TU-722 8mil H/H

75 µm No flow Prepreg Tu-84P NF 1080(63%)

L6 15 µm Base Cu of CCL

50 µm FR4

L7 9 µm Base Cu of CCL

20 µm Plated Cu

50 µm Normal Prepreg Tu-72P 106(73%)

L8 9 µm Copper foil Hoz

22 µm Plated Cu

10 µm Plated Cu

20 µm Soldermask PSR4000 BL01

Rigid 1171 µm

Flex 129 µm

TU-722 2mil H/H

TU-722 2mil H/H

CJA0525KA

CJA0525KA

AK182518

- 8L for rigid, 2L for Flex

- Stack via

- Solid via

- Via in Pad

| Copyright ©2011 Multek. All rights reserved. |

35

Rigid Flex – (1+1+2+1+1)

- 6L for rigid, 2L for Flex

- L2- L5 Buried/Filled via

- HDI

Thickness Description Material Spec.

20 µm solder mask Taiyo PRS4000

L1 20 µm Plated Copper

9 µm Base Copper Jada copper foil

56 µm Normal PP Tu-72P-7 106(RC73%)

L2 20 µm Plated Copper

9 µm Base Copper

50 µm FR4

58 µm No flow PP Tu-84P NF 106(RC70%)

Coverlay 13 µm

25 µm

L3 15 µm

50 µm

L4 15 µm

25 µm

Coverlay 13 µm

58 µm No flow PP Tu-84P NF 106(RC70%)

50 µm FR4

9 µm Base Copper

L5 20 µm Plated Copper

56 µm Normal PP Tu-72P-7 106(RC73%)

9 µm Base Copper Jada copper foil

L6 20 µm Plated Copper

20 µm solder mask Taiyo PRS4000

Rigid 564 µm

Flex 156 µm

Coverlay

Flex Layer

Coverlay

AP8525R

Tu-722-7 2mil H/H

Tu-722-7 2mil H/H

CJA0525KA

CJA0525KA

| Copyright ©2011 Multek. All rights reserved. |

36 ©2011 Multek. All rights reserved. |

Special automotive product-8 layer rigid flex with solid via

Camera for Automotive:

Micro vias on layer 12,23,67,78

Buried via on layer 27

solid via for layer 23 & 67

LPI solder mask: 2mil registration

| Copyright ©2011 Multek. All rights reserved. |

37 Copyright ©2011 Multek. All rights reserved. |

ELIC (solid via) RF stackups & conventional

D/S FPC moving layers to production

•4+2+4 Rigid flex

Thk(um) Description

20 SM

L1 20 Plated Cu

9 Base Cu

PP 106X1 55 Normal PP

L2 20 Plated Cu

9 Base Cu

PP 106X1 55 Normal PP

L3 20 Plated Cu

9 Base Cu

PP 106X1 55 Normal PP

L4 20 Plated Cu

9 Base Cu of FCCL

Single side FCCL 12 PI of FCCL

NF prepreg 55 No flow PP

Coverlay 12 PI of CL

25 Adh of CL

L5 15 Base Cu of FCCL

Polyimide 25 PI of FCCL

L6 15 Base Cu of FCCL

25 Adh of CL

Coverlay 12 PI of CL

NF prepreg 55 No flow PP

Single side FCCL 12 PI of FCCL

L7 9 Base Cu of FCCL

20 Plated Cu

PP 106X1 55 Normal PP

L8 9 Base Cu

20 Plated Cu

PP 106X1 55 Normal PP

L9 9 Base Cu

20 Plated Cu

PP 106X1 55 Normal PP

L10 9 Base Cu

20 Plated Cu

20 SM

Overall thk(um) 791

38 ©2011 Multek. All rights reserved. |

Looking forward to 2012 and beyond: ELIC solutions for RF designs

with 0.025mm BV using Novaflex® FPC

Summary

•Global market demand for Smartphones

and Tablets have accelerated (and funded)

the technology development of stacked

µvias and associated mass production

infrastructure.

•Filled via technologies are now essential

PCB fabrication processes to achieve high

SMT yield and reliability for Area Array IC

package and fine pitch passive

components assembly.

•Filled and stacked µvia sequential

processing is maturing to very high yields.

•Rigid-flex PCB technology using ELIC is

receiving increased emphasis in new

product designs to achieve:

• Higher volumetric interconnection of

components and structural featuring within the

PCB.

• Elimination of traditional connectors and ACF

bonding FPCs to rigid PCBs with inherent cost

and reliability issues.

• Laminate, Materials, Chemistry, and

Equipment suppliers roadmaps are on track to

provide compatible LF/HF materials and µvia

process systems for Rigid-flex to move to

mainstream.

39 Copyright ©2011 Multek. All rights reserved. |

Acknowledgements

Many thanks for the support and many technical contributions from:

Multek Field Application Engineers:

Tony Cosentino, Victor Llanes, Pedro Macias, Todd Robinson, and

Dan Slocum

Multek Flex Circuits Engineering:

Simpson Chan

Multek Doumen Advanced Development Engineering:

Jim Poon, TM Chan and Marie Yu

Multek Doumen-Process Engineering-:

Simon Au and James Leung

40 | Copyright ©2011 Multek. All rights reserved. |