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Equivalent Circuit MESFET/HEMT Modelling Approaches
Angel Mediavilla, Tomás Fernandez, J.A. García
Antonio Tazón, F. Marante*
Dpto. Ingeniería de Comunicaciones
ETSII de Telecomunicación
Universidad de CANTABRIA
* Dpto. Telecomunicaciones – ISPJAE- La Habana
UNICAN
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Presenter Contact Data
Angel Mediavilla
Dpto. Ingeniería de Comunicaciones
ETSII de Telecomunicación
Universidad de Cantabria
Av. Los Castros s/n
39005 – Santander – Cantabria – Spain
Phone: +34-942-201490 Fax: +34-942-201488
Mail: [email protected]
Web: http://www.unican.es
Was born in Santander, Spain, in 1955. He graduated in 1978 and received the Doctor of Physics (Electronic) degree with honours in 1983, both from the University of Cantabria, Santander, Spain.
From 1980 to 1983 he was Ingenieur Stagiere at THOMSON-CSF, France. He is currently professor at the Department of Communications Engineering at the University of Cantabria. He has a wide experience in the analysis and optimization of nonlinear microwave active devices in both hybrid and monolithic technologies. He is currently working in the area of nonlinear MESFET/HEMT and HBT device modelling with special application to the large signal computer design and intermodulation properties
A. MEDIAVILLA
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Outline
Brief Introduction
- Physics of the device
- Physical meaning of the EECM
- Extraction techniques
- Analytical equations
- Temperature description
- Intermodulation Properties
- Conclusions
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
S G D
N+ GaAs
N Channel
Undopped Buffer
Semi Insulating GaAs
S G D
N+ GaAs
N AlGaAs
Undopped Buffer
Semi Insulating GaAs 2Deg AlGaAs
Active Region Ohmic Contact
MESFETMESFET HEMTHEMT
GaAsFETDevices
GaAsFETDevices
due to the 2Deg layer:- Superior mobility- Higher frequency- Lower noise figureIf GaN: higher Power density
MESFET / HEMT DevicesMESFET / HEMT Devices
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
S G D
N+ GaAs
N AlGaAs
Undoped GaAs Buffer
Semi Insulating GaAs 2Deg AlGaAs
HEMTHEMT
Simplified operation for HEMT DevicesSimplified operation for HEMT Devices
� A wide-bandgap material N AlGaAs lies on a undopednarrow-bandgap material GaAs.
� Thickness and Doping density of N AlGaAs chosen forabsence of free electrons under normal operation.
� Sharp dip in Ec occurs in the boundary: High carrierconcentration in this region (2Deg), and do not encounterdonnor atoms: high mobility
� Current flows through the electron gaz controlled by Vgs.As Vds increases, current saturates.
� As Vgs is more positive, sheet carrier density tends todecrease and current tends to saturateG
SchottkyGate
NAlGaAs
undopedGaAs
Ec
Ef
Ev2Deg
region
Band Diagram
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Physical Meaning of the Equivalent Circuit ModelPhysical Meaning of the Equivalent Circuit Model
Rs
S G D
Rd
R g
Cgs
CgdRi
Cds
Ids,τ
Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
CdsIds,τ
Ri
Parasitic Inductances Lg, Ld, Ls:- due to metal contact pads- Lg, Ld between 5 to 20pH- Ls is lower: 1pH
Parasitic Resistances Rg, Rd, Rs:-Rd, Rs: ohmic contacts < 1 ohm-Rg: metalization resistance < 1 ohm
Intrinsic Resistance Ri:-Questionable physical meaning-Introduced to improve S11
Vds
Vgs
Ids(Vgs,Vds,τ)
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Modelización MESFET/HEMT
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Physical Meaning of the Equivalent Circuit ModelPhysical Meaning of the Equivalent Circuit Model
Rs
S G D
Rd
R g
Cgs
Cgd
Ri
Cds
Ids,τ
Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
CdsIds,τ
Ri
Intrinsic Capacitances Cgs,Cgd,Cds:- Cgs,Cgd: depletion charge- Cds: geometrical capacitance D-S - Cgs: 1pF/mm, Cgd&Cds 1/10 Cgs
Intrinsic Current Source Ids:- reproduces I/V curves- will reproduce the Gm and Gds values
Transconductande delay ττττ :-Current does not respond instantaneously tochanges in Gate voltage.- Order of 1ps. Increases with Gate length
Vds
Vgs
Ids[Vgs(t- τ),Vds]
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Modelización MESFET/HEMT
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Dependence on the Bias Point (NL elemens)Dependence on the Bias Point (NL elemens)
Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
CdsIds,τ
Ri
Vds
Vgs
Ids[Vgs(t- τ),Vds]
Main Nonlinear Elements:
- Ids : Obviously I/V curves
- Cgs and Cgd depend on the bias becausethe depletion region changes with the bias
Secondary Nonlinear Elements:
- Parasitic resistors
- Cds geometrical capacitance
- Transconductance delay ττττ
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Small Signal Equivalent Circuit for a given Bias PointSmall Signal Equivalent Circuit for a given Bias Point
Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
Cd
s
Gm
e-j
ωτ.V
gs
Ri
Vds
Vgs
Ids[Vgs(t- τ),Vds] � Gm e-jωτ .Vgs. + Gds.Vds
Given a Bias Point Vgso,Vdso
Gd
s
δδδδIdsGm = --------
δδδδVgs Vgso,Vdso
δδδδIdsGds = --------
δδδδVds Vgso,Vdso
Transconductance
Output Conductance
LINEAR EquivalentCircuit. Now Vgs andVds are AC values
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Modelización MESFET/HEMT
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350
300
100
0
200
250
150
50
0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.00
Vds
Id (mA)
Vgs
-1.0
-0.6
-0.2
0
0.2
0.6
1.0350
300
100
0
200
250
150
50
0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.00
Vds
Id (mA)
Vgs
-1.0
-0.6
-0.2
0
0.2
0.6
1.0
Example of I/V curves (DC)Example of I/V curves (DC)
Gds<0
Gds>0
Gm High
Gm low
Phenomena in DC:
- Gds<0 high current area(self-heating).
-Very different Slopes for Gds
- Gm varies having a max. atmedium curren range.
-Vgs Pinch-off voltage varieswith Vds.
- Soft Pinch-off evolution
Gm Low
All these behaviours must be tacken into account in order to write anequation for the Ids current source in DC.
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Modelización MESFET/HEMT
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101 102 103 104 105
2.6
2.4
2.2
2.0
1.8
1.6
1.4
1.2
1.0
Gd
s(m
S)
Frequency (Hz)
Gds Output Conductance Dispersion
101 102 103 104 105
40
35
30
25
20
15
10
5
0
Gm
(mS
)
Frequency (Hz)
Gm Transconductance Dispersion
Ids High
Ids Low
Gds = (δ δ δ δ Ids / δ δ δ δ Vds)|Vgo,Vdo Gm = (δ δ δ δ Ids / δ δ δ δ Vgs)|Vgo,Vdo
DC
area
RF
area
Transition
area
VERY IMPORTANT NOT IMPORTANT
From AC meas. orfrom S meas.
Cutoff
Behaviour of Gm and Gds in RF OperationBehaviour of Gm and Gds in RF Operation
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Modelización MESFET/HEMT
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Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
Cd
s
Gm
e-j
ωτ.V
gs
Ri
Vds
Vgs
Gd
s
LINEAR EquivalentCircuit.
Compensation for Gds in RF OperationCompensation for Gds in RF Operation
Clf
Rlf
- Above cutoff, the DC output resistance Gdsparallels with the additional Rlf.
- The Clf capacitor is in the microfaradrange because cutoff is in the KHz range.
-This correction is the same at anybias point (first approach)
-This correction can be used in Large Signalequivalent circuit
Given a Bias Point Vgso,Vdso
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
DE
VIC
E M
EA
SU
RE
ME
NT
S
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Modelización MESFET/HEMT
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S Measurement SetupS Measurement Setup
Pay attention to theaccess resistancesinside the N.A.
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Modelización MESFET/HEMT
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How to extract the values of the SS equivalent circuitHow to extract the values of the SS equivalent circuit
Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
Cd
s
Gm
e-j
ωτ.V
gs
Ri
Vds
Vgs
Gd
s
LINEAR EquivalentCircuit.
Intrinsicpart
Totaldevice
S params
Given a Bias Point Vgso,Vdso
Totaldevice
Z or Y params
Intrinsicpart
Y params
Circuit Transf.
De-embedding
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Modelización MESFET/HEMT
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How to extract the values of the SS equivalent circuitHow to extract the values of the SS equivalent circuit
[ ]C
Ygd =
− Im 12
ω
[ ] [ ] [ ]( )[ ] [ ]( )
CY Y Y
Y Ygs =
+⋅ +
+
Im Im Re
Im Im
11 12 12
2
11 12
21
ω
[ ][ ]( ) [ ] [ ]( )
RY
Y Y Yi =
+ +
Re
Re Im Im
11
11
2
11 12
2
( ) [ ]( ) [ ]( )G C R Y Y Cm gs i gd= + ⋅ ⋅ ⋅ + + ⋅12 2 2
21
2
21
2ω ωRe Im
[ ] [ ][ ] [ ]
τω
ω ω
ω ω= ⋅
− ⋅ ⋅ ⋅ − ⋅
− ⋅ ⋅ ⋅ − ⋅ ⋅ ⋅
1 21 21
21 212
arctg - Im Re
Re Im
Y R C Y C
Y R C Y R C C
i gs gd
i gs i gs gd
[ ]C
Y Cds
gd=
− ⋅Im 22 ω
ω
[ ]G Yds = Re 22
Capacitors
Internal Resistor
Current Source
From Intrinsic Y params.
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Vgs=-0.5
Vgs=0.5
Vgs=10.8
0.6
0.4
0.2
00 2 4 6 8
Cgs (pF)
Vds (Volt)
Vgs=-1
0.3
0.24
0.18
0.12
00 2 4 6 8
Cgd (pF)
Vds (Volt)
Vgs=1
Vgs=0.5
Vgs=-0.5
Vgs=-1
0.06
Multibias Extraction (Capacitors)Multibias Extraction (Capacitors)
CdsTauRi
CdsTauRi
CONSTANTSIn a first step
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Modelización MESFET/HEMT
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-2-1.5
-1-0.5
00.5 1.5
2
2.5
3
0
20
40
60
Vgs [V]
Vds [V]
Gm
[m
S]
HEMT: DO2AH. Gm vs. Vgs & Vds.
-2-1.5
-1-0.5
00.5 1.5
2
2.5
3
0
1
2
3
4
Vgs [V]
Vds [V]G
ds [m
S]
HEMT: DO2AH. Gds vs. Vgs & Vds.Gm Gds
Multibias Extraction (Gm & Gds)Multibias Extraction (Gm & Gds)
Gain Compression
Pinchoffregion
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Modelización MESFET/HEMT
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Device Breakdown: DC and PulsedDevice Breakdown: DC and Pulsed
IgId
VgsVds
Ibreak - Occurs when the GD junction is highlynegatively biased (Ibreak=-Ig)
-DC breakdown < Pulsed breakdown
- Important in Power Applications
Vgs = -3
-2.5
-2
Vds
Id
10 to 20 volt
GaN devicesvery high
DC Breakdown
Pulsed Breakdown
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Extended HEMT Nonlinear ModelExtended HEMT Nonlinear Model
Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
Cd
s
Ids,τ
Ri
Vds
Vgs
Ids[Vgs(t- τ),Vds]
Igs
Igd
Rgd
Clf
Rlf
G-D Breakdown
Gatecurrent
High frequency
- Normally: G-D breakdown and
Gate current are modelled by
using simple diode equations.
- Rgd: high freq. fitting to S.
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Modelización MESFET/HEMT
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-2-1.5
-1-0.5
00.5 1.5
2
2.5
3
0
20
40
60
Vgs [V]
Vds [V]
Gm
[m
S]
HEMT: DO2AH. Gm vs. Vgs & Vds.
Equations for the HEMT Nonlinear Model (Angelov)Equations for the HEMT Nonlinear Model (Angelov)
Ids(Vgs,Vds) = Ipk.[1+tanh(ΦΦΦΦ)].(1+λλλλ.Vds).tanh(αααα.Vds)
ΦΦΦΦ = P1m.(Vgs-Vpk) + P2(Vgs-Vpk)2 + P3(Vgs-Vpk)3 + ...
P1m = P1 / [1+B1/cosh2(B2.Vds)]
Vpk = Vpko + (Vpks-Vpko).tanh(α.Vds)
as Vpk and P1m dpends on Vds:
Vpk and Ipk : values at peak Gm
Vgs dependence Saturation Slope Initial increase slope
αααα = αr + αs.[1+tanh(Φ)]
as α depends on Vgs,Vds:
Current is continuously derivable
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
350
300
100
0
200
250
150
50
0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.00
Vds
Id (mA)
Vgs
-1.0
-0.6
-0.2
0
0.2
0.6
1.0350
300
100
0
200
250
150
50
0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.00
Vds
Id (mA)
Vgs
-1.0
-0.6
-0.2
0
0.2
0.6
1.0
ΦΦΦΦ
λλλλ
αααα
λλλλ : Saturation Slope
αααα : Initial Slope
ΦΦΦΦ : Gate modulation
Vpk(Vds) & P1m(Vds)controls the pinchoffdependence with Vds
Simplified meaning of the different parametersSimplified meaning of the different parameters
The Hiperbolic Tangent assures thecontinuity and coherence of the highOrder derivatives
The Hiperbolic Tangent assures theSoft Pinchoff evolution
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Modelización MESFET/HEMT
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Equations for the HEMT Nonlinear Model (Angelov)Equations for the HEMT Nonlinear Model (Angelov)
Reactive Current:
∂Qg ∂Vgs ∂Qg ∂VgdIg = -------- . -------- + -------- . --------
∂Vgs ∂t ∂Vgd ∂t
Cgs(Vgs,Vds) = Cgs1 + Cgs2 = ∂∂∂∂Qg/∂∂∂∂Vgs
Cgs1(Vgs,Vds) = Adiv.Cgso.[1+tanh(P20+P21.Vds)].[1+tanh(P10+P11.Vgs)]
Cgs2(Vgs,Vds) = (1-Adiv).Cgso.[1+tanh(P20+P21.Vds)].[1+tanh(P110+P111.Vgs)]
Cgd(Vgs,Vds) = ∂∂∂∂Qg/∂∂∂∂Vgd = Cgdo.[1+tanh(P30+P31.Vds)].[1+tanh(P40+P41.Vgd)]
Qg : total charge in the channel
Adiv ≅ 1
Charge is continuously derivable
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Modelización MESFET/HEMT
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Ids
Vds
Q(Vgs0,Vds0) Vgs
DC
Pulsed
Ids
Vds
Q’(Vgs0,Vds0) Vgs
DC
Pulsed
For each bias point we have a Pulsed I/V plane
Frequency Dispersion EffectsFrequency Dispersion Effects
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Modelización MESFET/HEMT
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IdsDC
Clf(µµµµF)
Rlf
Clf(µµµµF)
Rlf(VgsDC,VdsDC)
Possible Solutions
IdsDC
Clf(µµµµF)
Ipu(Vgs,Vds)
IdsDC
Clf(µµµµF)
Ipu(VgsDC,VdsDC,Vgsi,Vdsi)
SingleBias
MultiBias
Pulsed I/VSingle-Bias
Pulsed I/VMulti-Bias
IdsDC
IdsDC
Frequency Dispersion EffectsFrequency Dispersion Effects
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Modelización MESFET/HEMT
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Lg Ld
Ls
Rg Rd
Rs
Cgs
Cgd
Cd
s
Ids,τ
Ri
Vds
Vgs
Ids[Vgs(t- τ),Vds]
Igs
Igd
Rgd
Clf
G-D Breakdown
Gatecurrent
High frequency
Ilf
Ilf(VgsDC,VdsDC,Vgs,Vds)
Frequency Dispersion EffectsFrequency Dispersion Effects
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Modelización MESFET/HEMT
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LAYOUT
HEMT DEVICE
1 to 21 GHz (-1,3)
ValidationValidation
0
0.5
1
1.5
22.5
34
56
78
Vds ( V )
-3
-2.5
-2
-1.5
-1
-0.5
0
Vgs ( V )
0
2
4
6
8
10Etot (%)
0
2
4
6
8
10Etot (%)
Multibias Scattering
-2
-1.5
-1
-0.5
0
0.5
1
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
Sa
tura
tio
nS
lop
eλλ λλ
Cd
s(p
F)
Linear Scaling
Nonlinear Scaling
Linear Scaling Rules (W)
Non-Linear Scaling Rules (W)
ValidationValidation
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Modelización MESFET/HEMT
UNICANBRNO- march 2011
ValidationValidation
Pulsed I/V validation for a givenBias Point
GEC-MARCONI F-20 Bathtub 10*140 micronsGaAs MESFET
MEASURED
MODELED
Pin-Pout validation for a givenBias Point