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Editor-in-Chief: Joaquim Jorge
Depto. de Engenharia Informatica, IST/UTL, Avenida Rovisco Pais, 1000-049, Lisboa, Portugal, Email: [email protected]
Associate Editors
An International Journal
Hujun BaoZhejiang University, Hangzhou, ChinaBedrich Benes Purdue University, West Lafayette, USAMark Billinghurst University of Canterbury, Christchurch, New ZealandMario BotschUniversity of Bielefeld, GermanyMin ChenSwansea University, Swansea, UKYiorgos ChrysanthouUniversity of Cyprus, Nicosia, CyprusJohn CollomosseUniversity of Surrey, Guildford, UKCarsten DachsbacherUniversität Stuttgart, Stuttgart, GermanyAndy M. DayUniversity of East Anglia, Norwich, UKJulie DorseyYale University, New Haven, CT, USAElmar Eisemann Delft University of Technology, Delft, NetherlandsHongbo FuCity University of Hong Kong, Hong KongDiego GutierrezUniversidad de Zaragoza, Zaragoza, SpainCharles HansenUniversity of Utah, Salt Lake City, UT, USAAlexander HornungDisney Research, Zurich, SwitzerlandShi-Min HuTsinghua University, Beijing, ChinaVictoria InterranteUniversity of Minnesota, Minneapolis, USA
Tobias Isenberg University of Groningen, NetherlandsGudrun KlinkerTechnische Universität München, München, GermanyLeif KobbeltRWTH-Aachen, Aachen, GermanyTong-Yee LeeNational Cheng-Kung University, TaiwanVictor Ostromoukhov Université Claude Bernard Lyon 1, Lyon, FranceBeryl PlimmerUniversity of Auckland, Auckland, New ZealandKari PulliNVidia Research, Palo Alto, CA, USADirk ReinersUniversity of Louisiana, Lafayette, LA, USAErik ReinhardUniversity of Bristol, Bristol, UKHolly Rushmeier Yale University, New Haven, CT, USAFaramarz Samavati University of Calgary, Calgary, CanadaLuís Paulo Santos University of Minho, Braga, PortugalDieter SchmalstiegTechnische Universität Graz, Graz, AustriaPradeep SenUniversity of New Mexico, Albuquerque, USAAriel ShamirThe Interdisciplinary Center, Herzliya, IsraelAndrei SharfBen-Gurion University, Beer-Sheva, Israel
Claudio T. Silva New York University: Poly, New York, USAOlga SorkineEidgenössische Technische Hochschule (ETH) Zürich, Zürich, SwitzerlandMichela SpagnuoloIMATI - Institute of Applied Math & Information Technologies, Genova, ItalyOliver StaadtUniversity of Rostock, Rostock, GermanyAnthony SteedUniversity College, London, UKLászló Szirmay-KalosTechnical University of Budapest, Budapest, HungaryAyellet TalTECHNION - Israel Institute of Technology, Haifa, IsraelMatthias TeschnerAlbert-Ludwigs-Universität Freiburg, Freiburg, GermanyAnna VilanovaUniversity of Eindhoven, Eindhoven, NetherlandsIngo WaldIntel Corp, Santa Clara, CA, USAWenping WangUniversity of Hong Kong, Hong KongTim Weyrich University College, London, UKMichael Wimmer Technische Universität Wien, Wien, AustriaKangKang Yin National University of Singapore, SingaporeAnders Ynnerman Linköping University, Norrköping, SwedenJun-Hai Yong Tsinghua University, Beijing, P.R. China
Cover illustration taken from ‘Linear Approximation of Bidirectional Reflectance Distribution Functions’ by Aydin Ozturk, Murat Kurt, Ahmet Bilgili, Cengiz Gungor, Computers & Graphics 32(2) 2008.
Editor Emeritus
J.L. Encarnação
Peter Bono Niantic, CT, USABianca Falcidieno Genova, ItalySteven Feiner New York, NY, USAJames Foley Atlanta, GA, USA
Henry Fuchs Chapel Hill, NC, USAMing C. LinNorth Carolina, NC, USAWerner Purgathofer Wien, AustriaJarek RossignacAtlanta, GA, USA
Vaclav SkalaPlzen, Czech RepublicWolfgang Strasser Tübingen, GermanyAndries van Dam Providence, RI, USABrian Wyvill Victoria, BC, Canada
Lee Yong TsuiSingapore
Editorial Advisory Board
