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surfaces of the permanent magnet, and a magnetic fluid injected between one of the inner peripheral surface and outer periph- eral surface of the magnetic fluid holding means, and a magnetic body opposed to it, wherein the magnetic fluid holding means is electroplated with a metal having a con- siderably smaller ionization tendency to the magnetic body to form a ground work plated layer, and then the magnetic fluid holding means is nonelectrode plated to form a nonelectrode plated layer on the surface of the groundwork plated layer and the surface of the permanent magnet.
Sand Blast Nozzle U.S. Patent 5,536,200. July 16, 1996 K.H. Kiess, Muelheim/Ruhr, Germany
A nozzle for a sand blaster for a dust- free blasting of planar surfaces with a blast material.
Alumina Abrasive Wheel U.S. Patent 5,536,283. July 16, 1996 D.A. Sheldon and R.S. Lundberg, assignors to Norton Co., Worcester, Mass.
An abrasive grinding wheel comprising alumina abrasive and a vitreous bond
wherein the vitreous bond after firing com- prises greater than 47% SiO2, less than 16% A1203, 0.05 to 2.5% K20, 7 to 11% Na20, 2.0 to 10.0% Li20 and 9 to 16% B203, and wherein the abrasive grinding wheel is substantially free of sol gel alu- mina abrasive.
Method of Phosphating Mixed Metal Surfaces U.S. Patent 5,536,336. July 16, 1996 M. Nakatsukasa and L Kawasaki, assignors to Nippon Paint Co. Ltd., Osaka, Japan
A phosphating method of conversion- treating metal surfaces of a combination of iron, steel, and/or galvanized steel and an aluminum alloy with a phosphate solution.
Galvanizing Magazine U.S. Patent 5,536,377. July 16, 1996 II/I. Hiermaier et aL, assignors to MTU Motoren- und Turbinen-Union, Munich, and BL Produktions GmbH, Tittling, both of Germany
A magazine having a longitudinal cen- tral axis for holding parts to be galvanized or plated, comprising a plurality of elec- trodes, each electrode comprising recepta- cles uniformly spaced from each other
along the respective electrode for holding parts with an electrical contact between parts and the respective electrode, and at least one magnet for holding parts in the receptacles so that a part surface to be galvanized or coated faces outwardly from the respective receptacle.
Sputtering Target Assembly U.S. Patent 5,536,380. July 16, 1996 B. Ocker and R. Hinterschuster, assignors to Leybold AG, Hanau, Germany
A large area sputter cathode having floating target segments.
Sputtering Device U.S, Patent 5,536,381. July 16, 1996 J-H. Lee, assignor to Samsung Electronics Co. Ltd., Suwon, Rep. of Korea
A sputtering device comprising a sput- tering chamber; a first electrode, which supports a substrate and is used as an elec- trode within the sputtering chamber; a tar- get composed of a source material to be sputtered towards the first electrode; a sec- ond electrode attached to the target; a shield, which is insulated from the second electrode and attached beneath the target;
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METAL F INISHING ° M A R C H 1997 99