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Adaptive Focal Plane Array -A Compact Spectral Imaging Sensor
William Gunning
March 5 2007
Approved for Public Release, Distribution Unlimited
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4. TITLE AND SUBTITLE Adaptive Focal Plane Array -A Compact Spectral Imaging Sensor
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7. PERFORMING ORGANIZATION NAME(S) AND ADDRESS(ES) Teledyne Technologies Co.
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12. DISTRIBUTION/AVAILABILITY STATEMENT Approved for public release, distribution unlimited
13. SUPPLEMENTARY NOTES DARPA Microsystems Technology Symposium held in San Jose, California on March 5-7, 2007.Presentations, The original document contains color images.
14. ABSTRACT
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Standard Form 298 (Rev. 8-98) Prescribed by ANSI Std Z39-18
Approved for Public Release, Distribution Unlimited
Motivation for LWIR / MWIR Adaptive FPA
• Conventional hyperspectral imaging systems– Large and Heavy– Generate large volumes of data– Typically scanning systems
• Conventional multispectral imaging systems– Fixed detection wavelengths limit
capabilityAFPA Objective: Develop a compact spectral imaging sensor to enable enhanced target detection / ID in a device that can be deployed on SWAP-constrained platforms and provide real time information• Wavelength tuned LWIR (8 – 11 µm / ∆λ FWHM ~ 100 nm)• Simultaneous pixel-registered broadband MWIR (3 – 5 µm)• Spatially resolved, intelligent spectral analysis
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AFPA Parameter Objectives
• MEMS tunable filter array integrated with a dual-band focal plane array• Parameters:
– Tuning range (individual filters or checkerboard): 8.0 µm ⇒ 11.0 µm– Filter bandwidth (FWHM): 100 nm ± 20 nm @ 10.0 µm– MWIR detection band: ~ 3.5 – 5 µm (nominal)– Filter dimension: ~ 400µm center-to-center spacing– Filter optical fill factor: ≥ 50%– FPA/ROIC: 640x480 20µm DB-FPA– Filter format: Spectral fovea (nominally 8 x 24 filters)– Operating temperature: ~ 80K– Filter tuning speed: ~ 1 msec
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TS&I MEMS Filter / AFPA Architecture (Notional)
Single Filter Pixel
MEMS FilterArray
0.0
0.2
0.4
0.6
0.8
1.0
1.2
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15Wavelength (Microns)
Rel
ativ
e R
espo
nse
0.0
0.2
0.4
0.6
0.8
1.0
1.2
Cav
ity T
rans
mis
sion
SiliconSubstrate
SiliconFlexure
FixedMirror
MoveableMirror
Mirror Support(Actuation Interconnect)
ActuationElectronics
Dual-Band DetectorArray (HgCdTe)
Dual-Band ReadoutIntegrated Circuit
(ROIC)(CMOS)
Dual-BandFocal Plane Array
Adaptive Focal Plane Array(AFPA)
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AFPA Phase II MEMS Tunable Filter Array
Si MEMS Substrate• Lower half of MEMS filter
structure• Includes stationary mirror,
actuation traces
MEMS filter array• Hybridized moveable mirrors• Spectral Fovea• 16 x 48 filter array• Filter footprint 200 x 200 µm
Direct Drive Interconnect Traces
DBFM Imager Area640 x 480 pixels
MechanicalMountingSurface
DBFM (MW / LW) Broadband Imaging Area• 480 x 480 pixels• “Conventional” DB Imaging
MW / LW AR CoatingMAIC Chip• Hybridized to MEMS
substrate• Direct interconnect to
each filter
Si MEMS Substrate• Lower half of MEMS filter
structure• Includes stationary mirror,
actuation traces
MEMS filter array• Hybridized moveable mirrors• Spectral Fovea• 16 x 48 filter array• Filter footprint 200 x 200 µm
Direct Drive Interconnect Traces
DBFM Imager Area640 x 480 pixels
MechanicalMountingSurface
DBFM (MW / LW) Broadband Imaging Area• 480 x 480 pixels• “Conventional” DB Imaging
MW / LW AR CoatingMAIC Chip• Hybridized to MEMS
substrate• Direct interconnect to
each filter
DB-FPA (MW / LW)
MEMS Actuation IC (MAIC) Chip
DB-FPA Imager Area• 640 x 480 pixels
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MEMS Fabry-Perot Filter Design
≈ ≈
SiliconSubstrate
Au-Au Thermocompression
bond
AntireflectionCoating
AntireflectionCoating
Reflector CoatingsMovableMirror
MembraneSpring Flexures
Au- AuMirror(Optical Aperture) ThermocompressionBond Spacers
Mirror(Optical Aperture)
Folded Flexure
Filter characteristics • Fabry-Perot filter design• Tuning band determined by reflection
band of dielectric mirrors
Filter Actuation• Filter actuated by applying potential between
moveable mirror and substrate mirror• Displacement driven by electrostatic attraction• Restoring force provided by Si flexure springs• Prototype devices - direct drive
MEMS structure• Bulk micromachining • Hybrid assembly using Au-Au
thermocompression bond
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Modeled MWIR / LWIR Spectral Performance(Transmission Averaged over F/6.5 Incident cone)
Filter air gap varied between 3.1 – 5.6 µm
Wavelength (µm)3 4 5 6 7 8 9 10 11 12 3 4 5 6 7 8 9 10 11 12 3 4 5 6 7 8 9 10 11 12
20
40
60
80
100
Tran
smiss
ion
(%)
0
Approved for Public Release, Distribution Unlimited
MEMS Filter SEM Images
Top View
Moveable Mirror w/ Patterned AR Coating
Flexures
Supports
AR Coating
Si MirrorMembrane
Si Device Layer
Thinned Flexure
Au Bonding Pads
Mechanical Support
Bottom View
Patterned AR Coating (recessed)
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MEMS Tunable Filter Measured Optical Performance
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
8.5 8.7 8.9 9.1 9.3 9.5 9.7 9.9
Wavelength (µm)
Tran
smis
sion
(Nor
mal
ized
)
CO2 Laser Wavelength
(µm)
Filter Bandwidth (nm FWHM)
9.23 1449.28 1389.32 1459.49 1089.52 1129.55 1459.62 909.66 129
9 10 11 12Wavelength (µm)
0
100
200
300
400
500
Sign
al (m
V)
25V
20V
0V0V
20V
25VFilter 1Filter 2
25V
20V
0V0V
20V
25VFilter 1Filter 2
IR Microscope Transmission
Scanned Filter Transmission of Tunable CO2 laser
LWIR Detector Spectral Response with Tunable MEMS Filter
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Tunable MEMS Filter Mechanical Response
• Low energy dissipation in Si MEMS structure leads to mechanical “ringing” under vacuum operation– 300µs in air, but may be >10’s (or even 1000’s) msec in vacuum
• Exploit gas damping for increased response speed– Requires sealed, backfilled package– Neon gas provides necessary viscosity for 77K operation
-0.2
0
0.2
0.4
0.6
0.8
1
1.2
-0.0001 0 0.0001 0.0002 0.0003 0.0004 0.0005 0.0006 0.0007 0.0008 0.0009 0.001
Time (sec)
Rel
ativ
e Po
sitio
n ~ 300 µs settling time in 1 atmosphere of air
Q ~ 1.0
-0.2
0
0.2
0.4
0.6
0.8
1
1.2
-0.001 0 0.001 0.002 0.003 0.004 0.005 0.006 0.007 0.008 0.009 0.01
Time (sec)
Rel
ativ
e Po
sitio
n
Vacuum ⇒ Q~35
MEMS Filter Response to Voltage Actuation Step
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AFPA Phase II Imaging Device Objectives
• Demonstrate full capability MEMS filter array– Individual, independent filter tunability– Extended tuning range: 8.0 – 11.0 µm– Narrower bandwidth: 100 nm ± 20 nm @ 10.0 µm– Design and implement CMOS MEMS Actuation IC (MAIC) for full array actuation
• Demonstrate prototype AFPA sensor– Imaging structure with tunable MEMS array coupled with dual-band FPA– Demonstrate spectral tunability in an imaging array– Spectral Fovea configuration
• Technical challenges– Overcome tuning limit imposed by MEMS snap-down phenomenon
• Optimized optical filter design• Implement negative capacitance MEMS actuation to overcome parasitic• Provide viscous MEMS damping
– Heterogeneous technology integration in an integrated optimal subsystem
• Tunable MEMS filter array coupled to DB-FPA in a compact, gas-filled, optical, cryo-enclosure
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MEMS Actuation and Snap-down
VCp CMEMS
Maximum in Q(x) curve corresponds to charge snap-down limit
Theoretical maximum MEMS deflection before snap-down
using voltage control (33% of unactuated gap)
Cp / CMEMS0 0.2 0.4 0.6 0.8 10
0.2
0.4
0.6
0.8
1
V (x)Q_norm (x, 0.0)Q_norm (x, 0.55)Q_norm (x, 1.5)Q_norm (x, 5)Q_norm (x, 100)
Displacement “x” (fraction of gap)
Cp / CMEMS0 0.2 0.4 0.6 0.8 10
0.2
0.4
0.6
0.8
1
V (x)Q_norm (x, 0.0)Q_norm (x, 0.55)Q_norm (x, 1.5)Q_norm (x, 5)Q_norm (x, 100)
Displacement “x” (fraction of gap)
• Charge control enables tuning beyond snap-down
• Limited by parasitic capacitance between driver and MEMS device
• Negative capacitance circuit can overcome Cp
• Requires low MEMS Q to prevent oscillation past stable point
• Optimize optical coatings to maximize tuning slope / minimize demands on –Cp tuning
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Primary Sources of Parasitic Capacitance
• Parasitic Capacitance dominated by coupling capacitance– Values depend position inside filter array – Largest parasitic cap determines tuning range for entire array
• MAIC will add similar capacitance• Negative capacitance actuation circuit under development
to overcome Cp limited snap-down
C2cpM
C1gndM
C1padM
Capacitor Specific Capacitance Length or area max. total capacitance min. total capacitance Comment[aF/µm] or [aF/µm2] [µm] of [µm2] [fF] [fF]
C2cpM 40 3200 256 1 µm spacing
C1cpM 40 200 8 1 µm spacing
C1gndM 26 3200 83.2 1 µm SiO2 thickness
C16gndM 26 200 5.2 1 µm SiO2 thickness
CpadM 26 100 2.6 2.6 1 µm line widthTotal to GND 85.8 7.8Total coupling 256 8
Total 341.8 15.8
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Integrated AFPA Assembly (Conceptual)
Window
MAIC Connector
Vacuum / gas fill pinch-off tube
Removable cover(Indium crush seal)
MEMS array / MAIC / DB-FPA
MEMS filter array
MAIC
In-bump bond interconnect
Dual-band FPA
LCCMAIC
wirebonds
• Gas filled enclosure enables viscous gas damping of MEMS filters
• Resealable cover enables reuse and testing of MEMS filter array component
• MAIC / MEMS array interface key to achieving tuning beyond snap-down
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Planned AFPA Prototype Demonstration
• Demonstration of LWIR spectral response tunability– Independent filter actuation
• Demonstration of spectral analysis capability– Synthetic input spectra (filtered illumination)– Target materials if military interest
• Demonstration of spectral imaging of scene (lab)• Demonstration of simultaneous LWIR tuning / broadband MWIR imaging• Future development of field-testable camera with integrated optimal
spectral interrogation and analysis algorithms
Lab bench level testing planned using prototype AFPA sensor
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Summary
• Phase I - LWIR tunable MEMS filter capability demonstrated– Tuning range 8.0 – 10.0 µm– Filter bandwidth 90 – 150 nm– Tuning speed ~ 1 msec– Simultaneous broadband MWIR transmission– Filters as small as 280 x 280 µm
• Phase II - Integrated dual-band AFPA sensor configuration established– Spectral fovea configuration– Wide tuning range (8.0 – 11.0 µm) achievable using novel actuation and
optimized optical design– Independent filter tunability– Sensor package combining MEMS array, CMOS MAIC, Dual-band FPA with
mechanical MEMS damping– Optical configuration requires minimal optical imaging sensor modifications
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